Detection of interfaces with atomic resolution during material p

Details Detection of interfaces with atomic resolution during material p Detection of interfaces with atomic resolution during material p

1993-01-06

1994-03-15

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156 62F, 156345, 156643, 427 10, 118712, H01L 2100

Patent

active

052942899

ABSTRACT:
A technique for observing optical second harmonic generation effect at a surface of a material during processing thereof, particularly in the presence of a plasma, for controlling the processing of the material. A preferred form of the apparatus and method includes a combination of spectral, spatial, polarization and temporal filtering to allow observation of optical second harmonic generation and control of processing of the material with processes such as reactive ion etching to a high degree of resolution.

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