Detection of defects in patterned substrates

Details Detection of defects in patterned substrates Detection of defects in patterned substrates

2007-08-07

2007-08-07

Nguyen, Ha Tran (Department: 2829)

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

Of individual circuit component or element

C324S750010, C324S754120, C250S310000

Reexamination Certificate

active

11069491

ABSTRACT:
A method of detecting defects in a patterned substrate includes positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate.

REFERENCES:
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 5659172 (1997-08-01), Wagner et al.

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