Design tool for charge trapping memory using simulated...

Computer-aided design and analysis of circuits and semiconductor – Integrated circuit design processing – Testing or evaluating

Reexamination Certificate

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C716S115000, C703S013000

Reexamination Certificate

active

07971177

ABSTRACT:
A method for simulating operation of a charge trapping memory cell which computes the amount of charge trapped by determining first tunneling current through the tunneling layer, determining second tunneling current out of the charge trapping layer to the gate, determining third tunneling current escaping from traps in the charge trapping layer and tunneling out to the gate, and integrating said tunneling currents over a time interval. A change in threshold voltage can be computed for a transistor including the charge trapping structure. The parameter set can include only physical parameters, including layer thickness, band offsets and dielectric constants.

REFERENCES:
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