Semiconductor device manufacturing: process – With measuring or testing
Reexamination Certificate
2006-11-14
2006-11-14
Picardat, Kevin M. (Department: 2822)
Semiconductor device manufacturing: process
With measuring or testing
C438S010000, C438S017000
Reexamination Certificate
active
07135344
ABSTRACT:
A method for monitoring fabrication of an integrated circuit (IC) on a semiconductor wafer includes generating a product design profile (PDP) using an electronic design automation (EDA) tool, the PDP comprising an indication of a site in at least one layer of the IC that is susceptible to a process fault. Upon fabricating at least one layer of the IC on the wafer, a process monitoring tool is applied to perform a measurement at the site in at least one layer responsively to the PDP.
REFERENCES:
patent: 6415421 (2002-07-01), Anderson et al.
patent: 6425113 (2002-07-01), Anderson et al.
patent: 6529621 (2003-03-01), Alles et al.
patent: 2003/0229881 (2003-12-01), White et al.
patent: 2005/0004774 (2005-01-01), Volk et al.
Applied Materials Israel, Ltd., International Search Report and Written Opinion, PCT/US2004/02229, Oct. 14, 2004, 9 pp.
Sebasta W W et al, Development of a New Standard for Test, Sep. 10, 1999, Proceedings of the International Test Conference, Washington, pp. 988-993.
Ben-Porath Ariel
Bokobza Ofer
Levin Evgeny
Nehmadi Youval
Orbon, Jr. Jacob Joseph
Applied Materials Israel, Ltd.
Fahmi Tarek N.
Picardat Kevin M.
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