Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1987-11-05
1988-11-08
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430309, 524320, 524291, 524559, G03C 702
Patent
active
047833955
ABSTRACT:
The invention provides an organic solvent free, phosphate free, lithographic desensitizing composition which comprises:
REFERENCES:
patent: 3166421 (1965-01-01), Gramlich
patent: 3425977 (1969-02-01), Skoultaft et al.
patent: 3912844 (1975-08-01), Endo et al.
patent: 3998783 (1976-12-01), Whelan, Jr.
patent: 4033919 (1977-07-01), Lawson
patent: 4111819 (1978-09-01), Muijs
patent: 4193800 (1980-03-01), Iwama et al.
patent: 4221886 (1980-09-01), Topfl
patent: 4308340 (1981-12-01), Walls
patent: 4329422 (1982-05-01), Langlais
patent: 4349391 (1982-09-01), Schell
patent: 4370404 (1983-01-01), Tachikawa et al.
patent: 4530897 (1985-07-01), Berghaeuser et al.
Hsieh Shane
Mitchell Wayne A.
Doody Patrick A.
Hoechst Celanese Corporation
Michl Paul R.
Roberts Richard S.
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