Desensitizing solution for lithographic platemaking

Details Desensitizing solution for lithographic platemaking Desensitizing solution for lithographic platemaking

1994-09-02

1996-06-11

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430302, 430309, 1014501, 101451, 101466, 106 2, G03C 500

Patent

active

055254586

ABSTRACT:
A desensitizing solution for lithographic platemaking which mainly comprises phytic acid or a salt thereof is disclosed, said desensitizing solution containing a polyether polyamine or a derivative thereof represented by formula (I): ##STR1## wherein k, m, x, and y each represent an integer of 1 or more; and R.sub.1 represents a hydrogen atom or C.sub.n H.sub.2n R.sub.2, wherein n is an integer of 1 or more, and R.sub.2 represents a hydrogen atom, an NR.sub.3 R.sub.4 (wherein R.sub.3 and R.sub.4 each represent a hydrogen atom or an alkyl group), a chlorine atom, a fluorine atom, an iodine atom, a bromine atom, a hydroxyl group, a carboxyl group or a carbamoyl group,
or a polyamine derivative represented by formula (II): ##STR2## wherein X represents a halogen atom; p and each represent an integer of from 2 to 6; and r represents an integer of from 3 to 2000. The desensitizing solution exhibits satisfactory desensitizing characteristics without causing environmental pollution.

REFERENCES:
patent: 3617266 (1971-11-01), Williams et al.
patent: 4579591 (1986-04-01), Suzuki et al.
European Search Report dated Jan. 13, 1995.

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