Deposition of thin films of multicomponent materials

Details Deposition of thin films of multicomponent materials Deposition of thin films of multicomponent materials

1991-02-05

1993-03-23

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419218, 20419215, C23C 1434

Patent

active

051961016

ABSTRACT:
Composite films of multicomponent materials, such as oxides and nitrides, e.g., lead zirconate titanate, are deposited by dc magnetron sputtering, employing a rotating substrate holder, which rotates relative to a plurality of targets, one target for each metal element of the multicomponent material. The sputtering is carried out in a reactive atmosphere. The substrates on which the layers are deposited are at ambient temperature. Following deposition of the composite film, the film is heated to a temperature sufficient to initiate a solid state reaction and form the final product, which is substantially single phase and substantially homogeneous.

REFERENCES:
patent: 4640755 (1987-02-01), Sato
patent: 4647361 (1987-03-01), Bauer
patent: 4731172 (1988-03-01), Adachin et al.
patent: 4793908 (1988-12-01), Scott et al.
patent: 4929320 (1990-05-01), Yamada et al.
patent: 4938858 (1990-07-01), Zejda
patent: 4952295 (1990-08-01), Kawabata et al.
Screenivas et al., "Charaterization . . . targets", J. Appl. Phys. 64(3), Aug. 1988, pp. 1484-1493.

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