Deposition from liquid sources

Details Deposition from liquid sources Deposition from liquid sources

2011-04-12

2011-04-12

Everhart, Caridad M (Department: 2895)

Coating apparatus

Gas or vapor deposition

With treating means

C118S726000, C261S078100

Reexamination Certificate

active

07921805

ABSTRACT:
A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected to a source of silicon precursor, which preferably comprises liquid trisilane in a mixture with one or more dopant precursors. The mixture is metered as a liquid and delivered to the injector, where it is then vaporized and injected into the process chamber.

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