Deposition apparatus

Details Deposition apparatus Deposition apparatus

1996-10-25

1999-11-02

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723MP, 20429838, H05H 100

Patent

active

059750120

ABSTRACT:
A deposition apparatus including a deposition chamber containing therein a holder for holding a substrate and an electrode holding a sputtering target, a device for applying electrical power to the electrode, a gas supplying device for supplying gas to the deposition chamber, a evacuating device for evacuating the deposition chamber, and a microwave supplying device disposed around the deposition chamber. By virtue of such a construction, the deposition apparatus allows the target to be used with high efficiency and the ions to be maintained at a high density and low energy.

REFERENCES:
patent: 4776918 (1988-10-01), Otsubo et al.
patent: 4919077 (1990-04-01), Oda et al.
patent: 5294320 (1994-03-01), Somekh et al.
patent: 5433787 (1995-07-01), Suzuki et al.
patent: 5585148 (1996-12-01), Suzuki et al.

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