Deposited film forming apparatus

Details Deposited film forming apparatus Deposited film forming apparatus

1998-10-29

2000-11-21

Mills, Gregory

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118732, C23C 1600

Patent

active

061487635

ABSTRACT:
In a deposited film forming apparatus, at least part of the inner wall surfaces of a reactor or surfaces of structural component parts on which films are deposited is constituted of a porous ceramic material. This can prevent film come-off of deposited films on inner walls and structural component parts of the reactor as far as possible so that the spherical protuberances can be prevented from occurring and electrophotographic photosensitive members having a superior quality can be formed.

REFERENCES:
patent: 4633812 (1987-01-01), Fujiyama
patent: 4951602 (1990-08-01), Kanai
patent: 5192370 (1993-03-01), Oda et al.
patent: 5360484 (1994-11-01), Takai et al.

Affiliated with

Also associated with

Rating

Deposited film forming apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposited film forming apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposited film forming apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1248157