Deposit suppressant composition for the internal surfaces of a p

Details Deposit suppressant composition for the internal surfaces of a p Deposit suppressant composition for the internal surfaces of a p

1993-01-15

1994-06-14

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymerizing in reactor of specified material, or in reactor...

526 74, C08F 216

Patent

active

053211049

ABSTRACT:
Disclosed are a deposit suppressant composition for the internal surfaces of a polymerization reactor for polymerizing a vinyl monomer, comprising a naphthol sulfide compound having an average molecular weight of about 500 to 5000, as well as a method of polymerizing a vinyl monomer wherein prior to the polymerization, the deposit suppressant composition is applied to the internal surfaces of a polymerization reactor or added to the reaction system.

REFERENCES:
patent: 4431783 (1974-02-01), Walker et al.
patent: 4555555 (1985-11-01), Toyooka et al.
patent: 4933399 (1990-06-01), Shimizu et al.
patent: 5147948 (1992-09-01), Masuko et al.
Hawley's Condensed Chemical Dictionary, 11th Edition, 1987 pp. 302, 855, 938.

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