Deposit suppressant composition for a polmerization reactor and

Details Deposit suppressant composition for a polmerization reactor and Deposit suppressant composition for a polmerization reactor and

1999-06-28

2000-12-05

Henderson, Christopher

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymerizing in reactor of specified material, or in reactor...

526202, C08F 200

Patent

active

061568538

ABSTRACT:
Disclosed are a deposit suppressant composition for the internal surfaces of a polymerization reactor for polymerizing a vinyl monomer, including a polyhydric phenol sulfide compound having an average molecular weight of about 500 to 5000, as well as a method of polymerizing a vinyl monomer wherein prior to the polymerization, the internal surfaces of a polymerization reactor are coated with the deposit suppressant composition.

REFERENCES:
patent: 4200712 (1980-04-01), Cohen
patent: 4228130 (1980-10-01), Cohen
patent: 4431783 (1984-02-01), Walker et al.
patent: 4555555 (1985-11-01), Toyooka et al.
patent: 5147948 (1992-09-01), Masuko et al.

Affiliated with

Also associated with

Rating

Deposit suppressant composition for a polmerization reactor and does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposit suppressant composition for a polmerization reactor and , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposit suppressant composition for a polmerization reactor and will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-962583