Delta doped and counter doped dynamic threshold voltage MOSFET f

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257338, 257350, H01L 2976, H01L 2994, H01L 2701

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active

057808996

ABSTRACT:
A dynamic threshold voltage IGFET such as a MOSFET is operable at voltages of 0.6 volt or less. The threshold voltage of the transistor is reduced to zero volt or less by interconnecting the gate contact and the device body in which the voltage controlled channel is located. The channel region is delta-doped or counter-doped which permits superior performance for high-end VSLI applications. A selective epitaxy on a counter-doped substrate can be used in a counter-doped device. Doped wells can be used in a bulk silicon substrate in forming the devices. Trenching can be used to isolate devices in the doped wells.

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Santoni, "Sub-Volt ICs Raise Technology Issues"; Electronic News, vol. 41, No. 2066, May 22, 1995.
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Verdonckt-Vandebroek, Sophie, et al., High-Gain Lateral Bipolar Action in a MOSFET Structure, IEEE Trans. on Electron Devices, vol. 38, No. 11, Nov. 1991, pp. 2487-2495.
Parke, Stephen, et al., Bipolar-FET Hybrid-Mode Operation of Quarter-Micrometer SOI MOSFETS, IEEE Electron Device Letters, vol. 14, No. 5, May 1993, pp. 234-236.
Assaderahi, Fariborz, et al., A Novel Silicon-On-Insulator (SOI MOSFET for Ultra Low Voltage Operation, 1994 IEEE Symposium on Low Power Electronics, Oct. 10-12, San Diego, CA, pp. 58-59.

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