Defluxing agent cleaning method and cleaning apparatus

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

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134 2, 134 3, C11D 904, C03C 2300, C23G 102

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active

061402869

ABSTRACT:
The defluxing agent for flux residue after soldering contains an acid (preferably an organic acid, and particularly an acid stronger than abietic acid; for example, acrylic acid, acetic acid, propionic acid, benzoic acid) and an organic solvent (for example, xylene, benzyl acetate, methyl .alpha.-hydroxyisobutyrate, cyclohexanone, methyl .beta.-methoxyisobutyrate), and if necessary it further contains a monohydric alcohol, a surfactant and a corrosion inhibitor. Rinsing is preferably performed after the cleaning, using a solvent which is miscible with the defluxing agent, in order to completely remove the acid. There is also disclosed a cleaning apparatus which may be generally used for this and other cleaning.

REFERENCES:
patent: 2528230 (1950-02-01), King
patent: 3856695 (1974-12-01), Geiss et al.
patent: 3886099 (1975-05-01), Hall
patent: 4483783 (1984-11-01), Albanese
patent: 4640719 (1987-02-01), Hayes et al.
patent: 4830772 (1989-05-01), Van De Mark
patent: 4867800 (1989-09-01), Dishart et al.
patent: 4983224 (1991-01-01), Mombrun et al.
patent: 5062988 (1991-11-01), Dishart et al.
patent: 5080722 (1992-01-01), Englert et al.
patent: 5085365 (1992-02-01), Turner
patent: 5120371 (1992-06-01), Bolden et al.
patent: 5196136 (1993-03-01), Dishart et al.
patent: 5304253 (1994-04-01), Grant
patent: 5350457 (1994-09-01), Kitazawa et al.
patent: 5452840 (1995-09-01), Turner
patent: 5567348 (1996-10-01), Nozawa et al.
patent: 5612303 (1997-03-01), Takayanagi et al.
patent: 5695571 (1997-12-01), Watanabe et al.
patent: 5767048 (1998-06-01), Obuse
Chemical Abstracts, vol. 107, No. 2, Jul. 13, 1987, Columbus, Ohio.
English language abstract of Japanese Patent Publication 04068090 (Asahi Chem. Ind. Co.) Mar. 3, 1992.

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