Defining a pattern on a substrate

Details Defining a pattern on a substrate Defining a pattern on a substrate

2007-12-02

2010-12-07

Nguyen, Sang (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500

Reexamination Certificate

active

07847926

ABSTRACT:
The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.

REFERENCES:
patent: 5666189 (1997-09-01), Rostoker et al.
patent: 6313905 (2001-11-01), Brugger et al.
patent: 6727500 (2004-04-01), Berger et al.
patent: 7315367 (2008-01-01), Meyer et al.
patent: 2005/0046832 (2005-03-01), Kaller

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