Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-12-02
2010-12-07
Nguyen, Sang (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237500
Reexamination Certificate
active
07847926
ABSTRACT:
The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.
REFERENCES:
patent: 5666189 (1997-09-01), Rostoker et al.
patent: 6313905 (2001-11-01), Brugger et al.
patent: 6727500 (2004-04-01), Berger et al.
patent: 7315367 (2008-01-01), Meyer et al.
patent: 2005/0046832 (2005-03-01), Kaller
Meyer Gerhard
Ott Hanspeter
Schlittler Reto
Zahl Percy
Alexanian Vasken
International Business Machines - Corporation
Nguyen Sang
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