Defect-recognition processing apparatus

Image analysis – Histogram processing – For setting a threshold

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358106, 356237, G06K 900

Patent

active

049583735

ABSTRACT:
A defect-recognition processing apparatus converts into a defect image pattern, via a television camera, crystal defects present on the surface of an object under inspection, to process an image signal, by means of an image processing device, which corresponds to the defect image pattern, to measure rectangular images in terms of their length and their ratio between L.sub.Y and L.sub.X (L.sub.Y : a length in a longitudinal direction and L.sub.X : a length in the lateral direction of the wafer) and to detect defects developed on the surface of the aforementioned object.

REFERENCES:
patent: 4029962 (1977-06-01), Chapman
patent: 4764969 (1988-08-01), Ohtombe et al.
Murata et al., "A Study of Stacking Faults During CMOS Processing: Origin, Elimination and Contribution to Leakage," J. Electrochem. Soc.: Solid-State Science and Technology, vol. 127, No. 3, pp. 716-724, Mar. 1980.

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