Defect inspection system for phase shift masks

Details Defect inspection system for phase shift masks Defect inspection system for phase shift masks

1992-11-13

1994-10-04

Rosenberger, Richard A.

Optics: measuring and testing

By configuration comparison

With two images of single article compared

G01B 1124

Patent

active

053531167

ABSTRACT:
In the system according to the present invention detects defects by projecting illumination light for exposure having a certain wavelength perpendicularly onto a phase shift mask to be examined; picking up, by means of an image acquisition section, two pattern images which are formed from the irradiated light having passed through two neighboring dies on the phase shift mask and image-formed individually through respective magnifying projection optical systems, and superposing the image patterns of two dies through an alignment to compare therebetween.

REFERENCES:
patent: 5235400 (1993-08-01), Terasawa et al.
patent: 5270796 (1993-12-01), Tokui et al.
"Phase Shift Mask Pattern Accuracy Requirements and Inspection Technology", by James N. Wiley et al. no date.

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