Defect inspection system

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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Details

C356S237500

Reexamination Certificate

active

07733474

ABSTRACT:
A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increase a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, an oblique detection optics system receives the light from the defect at a reduced elevation angle with respect to the sample surface to reduce light from the sample rough surface, an oxide film rough bottom surface, and a circuit pattern, and increases the amount of the light from the defect and detected. The diameter of a lens is smaller than the diameter of a second lens, resulting in a reduction in the ability to focus the scattered light.

REFERENCES:
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patent: 7525649 (2009-04-01), Leong et al.
patent: 2005/0122508 (2005-06-01), Uto et al.
patent: 2005/0213086 (2005-09-01), Hamamatsu et al.
patent: 2006/0124874 (2006-06-01), Uto et al.
patent: 2006/0290923 (2006-12-01), Nakano et al.
patent: 2008/0059094 (2008-03-01), Shimura et al.
patent: 2008/0304055 (2008-12-01), Oshima et al.
patent: 3566589 (2004-06-01), None
patent: 2005-156537 (2005-06-01), None
patent: 2005-283190 (2005-10-01), None
patent: 2007-302997 (2007-11-01), None

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