Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2011-05-10
2011-05-10
Nguyen, Sang (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237100, C356S237400
Reexamination Certificate
active
07940385
ABSTRACT:
In a defect inspection apparatus for performing an inspection with an optical system, the dimension of a defect is measured substantially concurrently with detection of the defect. In order to promote the accuracy of measurement of the defect dimension, a correction unit is provided which corrects the defect dimension by using a standard sample such as a standard particle.
REFERENCES:
patent: 5905650 (1999-05-01), Tsutsui et al.
patent: 6009545 (1999-12-01), Tsutsui et al.
patent: 6762831 (2004-07-01), Shibata et al.
patent: 6855930 (2005-02-01), Okuda et al.
patent: 7539584 (2009-05-01), Bell et al.
patent: 2007/0182958 (2007-08-01), Manabe et al.
patent: 58223328 (1983-12-01), None
patent: 62-89336 (1987-04-01), None
patent: 5-273110 (1993-10-01), None
patent: 9-210919 (1997-08-01), None
patent: 2002-181725 (2002-06-01), None
patent: 2003-98111 (2003-04-01), None
patent: 2004-53972 (2004-02-01), None
patent: 2004-93252 (2004-03-01), None
patent: 2007-24737 (2007-02-01), None
Hamamatsu Akira
Maeda Shunji
Shibuya Hisae
Antonelli, Terry Stout & Kraus, LLP.
Hitachi High-Technologies Corporation
Nguyen Sang
LandOfFree
Defect inspection apparatus and its method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Defect inspection apparatus and its method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect inspection apparatus and its method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2645916