Defect inspection apparatus and defect inspection method

Details Defect inspection apparatus and defect inspection method Defect inspection apparatus and defect inspection method

2007-04-17

2007-04-17

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S310000, C250S306000, C250S307000

Reexamination Certificate

active

11042021

ABSTRACT:
An apparatus and a method for automatically inspecting a defect by an electron beam using an X-ray detector. The composition of a defective portion is analyzed with higher rapidity and the cause of the defect is easily and accurately determined based on an X-ray spectrum. The X-ray spectrum and the image of foreign particles formed on a process QC wafer are registered as reference data, and the defects generated on a process wafer are classified by collation with the reference data. The use of both the X-ray spectrum and the detected image optimizes the operating conditions for X-ray detection. A defect of which the X ray is to be detected is selected based on the result of classification of defect images automatically collected, and the defect is classified according to the features including both the composition and the external appearance.

REFERENCES:
patent: 4476386 (1984-10-01), Reid et al.
patent: 5369275 (1994-11-01), Usui et al.
patent: 5659174 (1997-08-01), Kaneoka et al.
patent: 5742658 (1998-04-01), Tiffin et al.
patent: 5777327 (1998-07-01), Mizuno
patent: 5801382 (1998-09-01), Noda et al.
patent: 6043486 (2000-03-01), Hossain
patent: 6072178 (2000-06-01), Mizuno
patent: 6140643 (2000-10-01), Brown et al.
patent: 6266390 (2001-07-01), Sommer et al.
patent: 6407386 (2002-06-01), Dotan et al.
patent: 6448555 (2002-09-01), Hosokawa
patent: 6753525 (2004-06-01), Testoni
patent: 10-27833 (1998-01-01), None
patent: 11-352081 (1999-12-01), None
patent: 2001-074437 (2001-03-01), None

Affiliated with

Also associated with

Rating

Defect inspection apparatus and defect inspection method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Defect inspection apparatus and defect inspection method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect inspection apparatus and defect inspection method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3731652