Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation
Reexamination Certificate
2011-05-31
2011-05-31
Bui, Bryan (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Quality evaluation
C356S237200
Reexamination Certificate
active
07953567
ABSTRACT:
A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.
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Abe Shigeru
Aiko Kenji
Chikamatsu Shuichi
Ito Masaaki
Noguchi Minori
Bui Bryan
Crowell & Moring LLP
Hitachi High-Technologies Corporation
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