Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2009-04-22
2010-06-08
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237300, C356S237400, C356S237500
Reexamination Certificate
active
07733475
ABSTRACT:
A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
REFERENCES:
patent: 5473426 (1995-12-01), Hayano et al.
patent: 5694214 (1997-12-01), Watanabe et al.
patent: 6014455 (2000-01-01), Sumiyoshi et al.
patent: 6721047 (2004-04-01), Shimoda et al.
patent: 7068364 (2006-06-01), Sugihara et al.
patent: 7535561 (2009-05-01), Chikamatsu et al.
patent: 2003/0044058 (2003-03-01), Tada
patent: 2007/0057184 (2007-03-01), Uto et al.
patent: 2008/0002195 (2008-01-01), Otani et al.
patent: 2009/0262339 (2009-10-01), Suga et al.
patent: 62-89336 (1987-04-01), None
patent: 63-135848 (1988-06-01), None
patent: 1-117024 (1989-05-01), None
patent: 1-250847 (1989-10-01), None
patent: 5-218163 (1993-08-01), None
patent: 6-258239 (1994-09-01), None
patent: 6-324003 (1994-11-01), None
patent: 8-210989 (1996-08-01), None
patent: 8-271437 (1996-10-01), None
patent: 2000-105203 (2000-04-01), None
patent: 2001-60607 (2001-03-01), None
patent: 2001-512237 (2001-08-01), None
patent: 2001-264264 (2001-09-01), None
patent: 2004-177284 (2004-06-01), None
patent: WO 99/06823 (1999-02-01), None
Aiko Kenji
Chikamatsu Shuichi
Noguchi Minori
Chowdhury Tarifur
Hitachi High-Technologies Corporation
McDermott Will & Emery LLP
Stock, Jr. Gordon J
LandOfFree
Defect inspecting apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Defect inspecting apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect inspecting apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4215407