Defect detection via multiscale wavelets-based algorithms

Details Defect detection via multiscale wavelets-based algorithms Defect detection via multiscale wavelets-based algorithms

2007-11-13

2007-11-13

Le, Brian (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C382S147000, C382S149000, C382S232000

Reexamination Certificate

active

10260374

ABSTRACT:
A method of detecting a defect in a reticle or wafer uses wavelet transforms to differentiate between real defects and pattern noise. A first image and a second image of a sample are aligned. A wavelet transform is obtained of the difference between the images. The wavelet transformed difference image is filtered to distinguish between real defects and pattern defects.

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patent: 2002/0057831 (2002-05-01), Hiroi et al.
patent: 2003/0063792 (2003-04-01), Hiroi et al.

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