Defect compensation of lithography on non-planar surface

Details Defect compensation of lithography on non-planar surface Defect compensation of lithography on non-planar surface

2006-02-28

2006-02-28

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Focal position of light source

C356S138000, C356S237100

Reexamination Certificate

active

07006208

ABSTRACT:
In an embodiment in accordance with the present invention, methods for dynamic detection and correction of focus and tilt variations that occur during a specific product layer exposure is by focus and tilt pre-compensation during wafer exposure. The method provides two spaced apart paths that provide both defocus and tilt measurements. A reference plane is defined by using three reference areas or fields. The data is fitted, using least squares or max/min error, to a “plane”, that is, to straight equidistant lines, the deviation from “plane” is computed as error from a set of straight equidistant lines. Lateral displacements of each band into focus error is converted using the formula: ΔZ=ΔX*θ.

REFERENCES:
patent: 6330052 (2001-12-01), Yonekawa et al.
patent: 2002/0044269 (2002-04-01), Yonekawa et al.

Affiliated with

Also associated with

Rating

Defect compensation of lithography on non-planar surface does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Defect compensation of lithography on non-planar surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect compensation of lithography on non-planar surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3641050