Deep UV sensitive photoresist resistant to latent image decay

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430326, 430192, 430193, G03C 1492

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active

053427343

ABSTRACT:
A positive working deep UV sensitive photoresist which provides improved critical dimension stability during prolonged periods of post exposure delay before baking comprises an acid stable polymer which is insoluble in water but normally soluble in an aqueous alkaline medium, a photoinitiator which generates acid upon exposure to actinic radiation, and a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol which is an acid labile compound which inhibits the dissolution of the normally soluble polymer in said alkaline medium.

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Nalamasu et al.; Effect of Post-Exposure Delay in Positive Acting Chemically Amplified Resists: An Analytical Study: Regional Technical Conference of the Mid-Hudson Section of the Society of Plastics Engineers; Oct., 1991.
Przybilla et al.; t-BOC Blocked hydroxyphenyl-Meth-acrylates: On the Way to Quarter Micron Deep-UV Lithography; Regional Technical Conference of the Mid-Hudson Section of the Society of Plastics Engineers; Oct. 1991.
Houlihan et al.; Phase transfer catalysis in the tert-butyloxycarbonylation of alcohols, phenols, and thiols with di-tert-butyl dicarbonate; Can. J. Chem., 63 (1985).

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