Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1992-05-13
1994-08-30
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, 430192, 430193, G03C 1492
Patent
active
053427343
ABSTRACT:
A positive working deep UV sensitive photoresist which provides improved critical dimension stability during prolonged periods of post exposure delay before baking comprises an acid stable polymer which is insoluble in water but normally soluble in an aqueous alkaline medium, a photoinitiator which generates acid upon exposure to actinic radiation, and a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol which is an acid labile compound which inhibits the dissolution of the normally soluble polymer in said alkaline medium.
REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 3915706 (1975-10-01), Limburg et al.
patent: 4273668 (1981-06-01), Crivello
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 5037721 (1991-08-01), Doessel
patent: 5166033 (1992-11-01), Oie et al.
Nalamasu et al.; Effect of Post-Exposure Delay in Positive Acting Chemically Amplified Resists: An Analytical Study: Regional Technical Conference of the Mid-Hudson Section of the Society of Plastics Engineers; Oct., 1991.
Przybilla et al.; t-BOC Blocked hydroxyphenyl-Meth-acrylates: On the Way to Quarter Micron Deep-UV Lithography; Regional Technical Conference of the Mid-Hudson Section of the Society of Plastics Engineers; Oct. 1991.
Houlihan et al.; Phase transfer catalysis in the tert-butyloxycarbonylation of alcohols, phenols, and thiols with di-tert-butyl dicarbonate; Can. J. Chem., 63 (1985).
Gal Chava
Grunwald John J.
Hirsch Shulamit
Lazarus Richard M.
Chapman Mark A.
Didrick Robert M.
McCamish Marion E.
Morton International Inc.
White Gerald K.
LandOfFree
Deep UV sensitive photoresist resistant to latent image decay does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Deep UV sensitive photoresist resistant to latent image decay, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deep UV sensitive photoresist resistant to latent image decay will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-29240