Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1995-04-05
1996-07-23
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427580, 427249, 427122, 423446, B05D 306, H05H 124
Patent
active
055387659
ABSTRACT:
A process for producing diamond includes a step of bringing a columnar cathode and a tubular pilot anode provided concentrically around the cathode, into proximity to a plasma jetting port of a front end portion of a tubular main anode provided concentrically around the pilot anode. According to the process, a voltage is applied across the cathode and the pilot anode to convert a pilot gas to the form of a plasma. Then, the cathode is moved away from the pilot anode along a common axis. The process also includes the step of holding the discharge voltage between the cathode and the pilot anode at a first preselected voltage, and then applying voltage across the cathode and the main anode to convert a main gas to the form of a plasma. Subsequently, at least the pilot anode is moved away from the main anode along the common axis while maintaining the discharge voltage between the cathode and the pilot anode at the first preselected voltage. The process further includes the steps of holding the discharge voltage between the cathode and the main anode at a second preselected voltage and jetting the main gas in the form of plasma from the jetting port while generating a main arc between the main anode and the cathode.
REFERENCES:
patent: 3949188 (1976-04-01), Tateno
patent: 3980802 (1976-09-01), Paton et al.
patent: 5070274 (1991-12-01), Yoshikawa et al.
patent: 5135807 (1992-08-01), Ito et al.
patent: 5180571 (1993-01-01), Hosoya et al.
patent: 5217700 (1993-06-01), Kurihara et al.
patent: 5235160 (1993-08-01), Suzuki et al.
patent: 5260106 (1993-11-01), Kawarada et al.
patent: 5314726 (1994-05-01), Kurihara et al.
patent: 5336326 (1994-08-01), Karner et al.
patent: 5349154 (1994-09-01), Harker et al.
patent: 5368897 (1994-11-01), Kurihara et al.
patent: 5382293 (1995-01-01), Kawarada et al.
Ohtake et al., "Diamond Film Preparation by Arc Discharge Plasma Jet Chemical Vapor Deposition in the Methane Atmosphere", J. Electrochem. Soc., vol. 137, No. 2, Feb. 1990.
Itani Tsukasa
Kawarada Motonobu
Kurihara Kazuaki
Sasaki Ken-ichi
Fujitsu Ltd.
King Roy V.
LandOfFree
DC plasma jet CVD method for producing diamond does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with DC plasma jet CVD method for producing diamond, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and DC plasma jet CVD method for producing diamond will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-711546