Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-01-11
2005-01-11
Siek, Vuthe (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
06842887
ABSTRACT:
A data processing system includes a data memory, in which data are stored, the data representing a set of predetermined geometrical basic forms and a set of geometrical operations that can be applied to the basic forms. The basic forms form place markers for electronic components in the layout. In other words, each component is represented by a geometrical basic form or a combination of a plurality of geometrical basic forms. The basic forms can be altered during the layout design by application of the geometrical operations. Such alteration creates a large margin of freedom in the design. On the other hand, the unaltered original basic forms are examined for verification of the layout design. As a result, the verification is simplified and “dummy” errors that are often a consequence of the complexity of a design are avoided. A method for designing the layout with the system is also provided.
REFERENCES:
patent: 4829446 (1989-05-01), Draney
patent: 5440720 (1995-08-01), Baisuck et al.
patent: 5621653 (1997-04-01), Yuzawa
Heineken, H. T. et al.: “CAD at the Design-Manufacturing Interface”, ACM, 1997, pp. 321-326.
Greenberg Lawrence A.
Infineon - Technologies AG
Lin Sun James
Locher Ralph E.
Siek Vuthe
LandOfFree
Data processing system for designing a layout of an... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Data processing system for designing a layout of an..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Data processing system for designing a layout of an... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3422681