Data processing method and apparatus, reticle mask, exposing...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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Details

C716S030000, C700S120000, C700S121000, C430S005000, C378S035000, C382S144000

Reexamination Certificate

active

06892375

ABSTRACT:
Disclosed are data processing method, apparatus, and computer readable medium for generating data about mask, reticle, etc., for making exposure, and exposing method, apparatus and computer readable medium for performing exposure during manufacture of LSI, semiconductor device, magnetic device, liquid crystal, etc. When generating revision exposure data from design data, the correction position of revision data is designated and data processing of only designated correction portion is performed. Positional information of correction portion is added to header or footer section of revision exposure data.

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