Data generating method, data generating device, and program...

Details Data generating method, data generating device, and program... Data generating method, data generating device, and program...

2011-06-28

2011-06-28

Siek, Vuthe (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Layout generation

C716S050000

Reexamination Certificate

active

07971159

ABSTRACT:
To provide a data generating method, device, and program that can generate drawing data for drawing the entire general design graphic data with an accuracy of about 1 to 4 nm in a drawing method or a drawing system adapted to draw gradation-controllable spotlights in a two-dimensional array. The data generating method is a method for generating, in an exposure system having a function of irradiating multigradation-controllable spotlights in a two-dimensional array onto a photosensitive film on a substrate, gradation values of the spotlights based on design graphic data. Using reference data classified by features of a graphic and describing in advance combinations of gradation values mapped to coordinate information of a graphic, the method discriminates the feature in the design graphic data near positions of the spotlights and selects the combination of the gradation values in the reference data corresponding to coordinate information of the positions of the spotlights, thereby determining the gradation values.

REFERENCES:
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patent: 4912568 (1990-03-01), Shimano
patent: 6428940 (2002-08-01), Sandstrom
patent: 2005/0280695 (2005-12-01), Groenen et al.
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patent: WO-03/052516 (2003-06-01), None
patent: WO-2004/095549 (2004-11-01), None
Ljungblad et al., “New Architecture for Laser Pattern Generators for 130 nm and Beyond,” 20thAnnual BACUS Symposium on Photomask Technology, vol. 4186, 2001, pp. 16-21.

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