Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2003-09-08
2008-03-04
Nguyen, Sang H. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237400, C356S237500, C356S394000, C250S234000
Reexamination Certificate
active
07339661
ABSTRACT:
Apparatus for inspection of a sample includes a radiation source, which is adapted to direct optical radiation onto an area of a surface of the sample, and a plurality of image sensors. Each of the image sensors is configured to receive the radiation scattered from the area into a different, respective angular range, so as to form respective images of the area. An image processor is adapted to process at least one of the respective images so as to detect a defect on the surface.
REFERENCES:
patent: 4933961 (1990-06-01), Rushbrooke et al.
patent: 5500770 (1996-03-01), Zinter et al.
patent: 5650614 (1997-07-01), Yasutake et al.
patent: 5822055 (1998-10-01), Tsai et al.
patent: 5900941 (1999-05-01), Matsuyama et al.
patent: 5903342 (1999-05-01), Yatsugake et al.
patent: 6122046 (2000-09-01), Almogy
patent: 6137570 (2000-10-01), Chuang et al.
patent: 6369888 (2002-04-01), Karpol et al.
patent: 6621570 (2003-09-01), Danko
patent: 6853446 (2005-02-01), Almogy et al.
patent: 7116413 (2006-10-01), Vaez-Iravani
Admoni Erez
Feldman Haim
Guetta Avishay
Haikoviz Lev
Kadar Ofer
Bach Joseph
Nguyen Sang H.
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