Damage-resistant coatings for EUV lithography components

Details Damage-resistant coatings for EUV lithography components Damage-resistant coatings for EUV lithography components

2006-01-03

2006-01-03

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06982133

ABSTRACT:
Damage-resistant coatings are provided on radiation-exposed surfaces of EUV lithographic components. The diamond coating provides resistance to particle impingement, cleaning processes, and degradation due to high temperatures. The diamond coating is beneficial when deposited on the reflecting surface of an EUV Si/Mo multilayer mirror, grazing collector incidence mirror, the reflecting surface of an EUV Si/Mo multilayer reflective mask, and radiation-exposed surfaces of EUV debris shield. The diamond coating provides longer lasting EUV components.

REFERENCES:
patent: 5304461 (1994-04-01), Inoue et al.
patent: 6673684 (2004-01-01), Huang et al.
patent: 6724462 (2004-04-01), Singh et al.
patent: 2004/0033699 (2004-02-01), Hector et al.

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