Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1993-04-09
1995-03-14
Dote, Janis L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, 430905, 430909, 430920, 430921, G03C 1492, G03F 7004
Patent
active
053976797
ABSTRACT:
This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.
REFERENCES:
patent: 5130225 (1992-07-01), Uetani
patent: 5242734 (1994-08-01), Lazarus et al.
The Japan Society of Applied Physics and Related Societies, The 38th Spring Meeting, Mar. 1991, (29a-ZC-7).
The Japan Society of Applied Physics and Related Societies, The 38th Spring Meeting, Mar. 1991, (30a-ZA-3).
Kusumoto Takehiro
Takeyama Naoki
Ueda Yuji
Ueki Hiromi
Dote Janis L.
Sumitomo Chemical Company Limited
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