Cyclic acetals or ketals of 8-keto esters or amides

Details Cyclic acetals or ketals of 8-keto esters or amides Cyclic acetals or ketals of 8-keto esters or amides

1987-11-27

1989-02-21

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430192, 430176, 549448, 549454, 549370, 549375, 549 6, 544215, G03C 1495, C07D40514, C07D40712, C07D40714

Patent

active

048064483

ABSTRACT:
Compounds of formula I ##STR1## in conjunction with compounds that donate acid when exposed to actinic radiation, are suitable for use as positive photoresists. In formula I, R.sup.1 and R.sup.2 are hydrogen, alkyl, aryl, cycloalkyl, aralkyl or alkaryl, R.sup.3 to R.sup.8 are hydrogen or lower alkyl, X is --O-- or --NR.sup.9 --, where R.sup.9 is hydrogen or C.sub.1 -C.sub.4 alkyl n is 0 or 1, m is 2, 3 or 4 and Q is an organic radical of valency m.
The photoresists are suitable for making printing formes, printed circuits, integrated circuits or silver-free photographic films.

REFERENCES:
patent: 4101323 (1976-07-01), Buhr et al.
patent: 4189323 (1980-02-01), Buhr
patent: 4247611 (1981-06-01), Sander et al.
patent: 4248957 (1981-02-01), Sander et al.
patent: 4250247 (1981-02-01), Sander et al.

Affiliated with

Also associated with

Rating

Cyclic acetals or ketals of 8-keto esters or amides does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cyclic acetals or ketals of 8-keto esters or amides, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cyclic acetals or ketals of 8-keto esters or amides will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1521664