Cyanoadamantyl compounds and polymers and photoresists...

Details Cyanoadamantyl compounds and polymers and photoresists... Cyanoadamantyl compounds and polymers and photoresists...

2007-09-18

2007-09-18

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S910000

Reexamination Certificate

active

11075544

ABSTRACT:
Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.

REFERENCES:
patent: 5399647 (1995-03-01), Nozaki
patent: 6495307 (2002-12-01), Uetani et al.
patent: 6579659 (2003-06-01), Uetani et al.
patent: 6635401 (2003-10-01), Li et al.
patent: 6692888 (2004-02-01), Barclay et al.
patent: 2005/0208418 (2005-09-01), Bae et al.
patent: 2006/0167302 (2006-07-01), Ito et al.
patent: 2006/0186160 (2006-08-01), Hubbe
patent: 1 172 384 (2002-01-01), None
patent: 1 225 480 (2002-07-01), None
patent: 2003-122007 (2003-04-01), None
patent: 2003162059 (2003-06-01), None
patent: 2004-029542 (2004-01-01), None

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