Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-05-23
2006-05-23
Kackar, Ram N (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S728000, C156S345520, C219S444100, C219S544000, C219S607000, C392S416000, C392S418000, C427S585000, C427S591000, C427S249150, C117S200000
Reexamination Certificate
active
07048802
ABSTRACT:
The invention relates to a device for depositing especially crystalline layers on especially crystalline substrates by means of reaction gases fed to a heated process chamber. Said process chamber is formed by the cavity of an especially multi-part graphite tube arranged in a reactor housing that especially comprises quartz walls. Said reactor housing, in the area of the process chamber, is enclosed by a high-frequency coil and the space between the reactor housing wall and the graphite tube is filled with a graphite foam sleeve. In order to improve heat insulation, the graphite foam sleeve is fully slit. The slot is wider than the maximum thermal elongation of the graphite foam sleeve in the peripheral direction to be expected when the device is heated up to process temperature.
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Berge Rune
Kaeppeler Johannes
Wischmeyer Frank
Aixtron AG
Kackar Ram N
St. Onge Steward Johnston & Reens LLC
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