CVD Process

Details CVD Process CVD Process

1982-09-02

1985-05-21

Bernstein, Hiram H.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

427 95, 156611, 156DIG89, C30B 2514

Patent

active

045184550

ABSTRACT:
A chemical vapor deposition epitaxial reactor (10) comprised of a quartz tube (12) with banks of IR lamp proximate the outside surface thereof. A splitter plate (30) located at the inlet of the tube (12) separates reactive gases and nonreactive gases directed longitudinally into the tube. The nonreactive gases, directed along the inside surface of the tube (12), substantially prevents unwanted reactant deposition on the inside surface of the tube (12).

REFERENCES:
patent: 3578495 (1971-05-01), Pammer et al.
patent: 3672948 (1972-06-01), Foehring et al.
patent: 4288408 (1981-09-01), Guth et al.
patent: 4341749 (1982-07-01), Iya et al.
Western Elec. Co., Technical Digest No. 11, 7/68, Whitner, 156-663, pp. 5, 6.

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