CVD platen heater system utilizing concentric electric heating e

Details CVD platen heater system utilizing concentric electric heating e CVD platen heater system utilizing concentric electric heating e

1991-09-11

1994-03-15

Evans, Geoffrey S.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219445, 219448, 392418, 338217, 118725, H01L 21306, H01L 2131

Patent

active

052947785

ABSTRACT:
A wafer support platen heating system for low pressure chemical vapor deposition of apparatus includes multiple resistance heaters for individual heating of multiple portions of the platen to provide a predetermined uniform or non-uniform temperature gradient/profile across the platen. The multiple graphite resistance heaters of the preferred embodiment include a spiral shaped main resistance heater and two single turn edge loss graphite resistance heaters located within the inner diameter and along the periphery of the outer diameter respectively of the main spiral shaped resistance heater.

REFERENCES:
patent: 1975410 (1934-10-01), Simpson
patent: 2093939 (1937-09-01), Strack
patent: 2330867 (1943-10-01), Challet
patent: 3381114 (1968-04-01), Nakanuma
patent: 4511789 (1985-04-01), Goessler et al.

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