CVD of silicon-based ceramic materials on internal surface of a

Details CVD of silicon-based ceramic materials on internal surface of a CVD of silicon-based ceramic materials on internal surface of a

1993-11-23

1995-05-09

King, Roy V.

Coating processes

Interior of hollow article coating

Coating by vapor, gas, mist, or smoke

427238, 4272481, B05D 722, C23C 1600

Patent

active

054138132

ABSTRACT:
In order to reduce the rate of coke formation during the industrial pyrolysis of hydrocarbons, the interior surface of a reactor is coated with a thin layer of a ceramic material, the layer being deposited by thermal decomposition of a non-oxygen containing silicon-nitrogen precursor in the vapor phase, in an inert or reducing gas atmosphere in order to minimize the formation of oxide ceramics.

REFERENCES:
patent: 4099990 (1978-07-01), Brown et al.
patent: 5208069 (1993-05-01), Clark et al.
Maury et al, "OMCVD of silicon carbide nitride mixtures using various organosilazane precursors", Proc. Eur. Conf. Chem. Vap. Deposition, 6th, Edited by Porat, (1987) pp. 390-397 (Abstract).
Obfescu et al, "Chemical vapor deposition of amorphous layers of the type Si.sub.x N.sub.y /Si.sub.x N.sub.y H.sub.z ", Rom. RO 101060 B1, Nov. 26, 1992 (Abstract).

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