CVD method of depositing a plurality of polycrystalline diamond

Details CVD method of depositing a plurality of polycrystalline diamond CVD method of depositing a plurality of polycrystalline diamond

1998-10-08

1999-09-21

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427573, 427575, 427249, 4272557, B05D 306, C23C 1626

Patent

active

059551550

ABSTRACT:
A CVD method of forming a diamond coated article is disclosed, which consists essentially of a substrate and a plurality of polycrystalline diamond film layers accumulatively coated thereon in a total thickness of at least 20 .mu.m, wherein each of the polycrystalline diamond film layers (i) has a thickness of 6 to 13 .mu.m, (ii) has an average crystallite size in the surface direction thereof of 3 to 7 .mu.m, (iii) has (111) oriented diamond crystallites exposed on the surface thereof, and (iv) satisfies the relationship: I(N)/I(D)<0.2, wherein I(D) represents an intensity of diamond Raman peak in counts/sec appearing around 1333 cm.sup.-1 and I(N) represents a maximum intensity among non-diamond Raman peaks appearing between 1200 cm.sup.-1 and 1600 cm.sup.-1.

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