CVD method for forming diamond films

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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4272498, 42724911, 4272555, 4272557, 427309, 4273722, 427573, B05D 306, C23C 1626

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active

060429003

ABSTRACT:
Method is provided for forming CVD nano diamond films for use as cold cathodes in microelectronic devices. Conditions for forming the film outside the plasma region between the cathode and a grid anode are disclosed. Heating of the grid anode makes possible a combination of glow discharge and hot filament deposition.

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