CVD diamond by alternating chemical reactions

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156DIG68, 423446, 427249, 4272551, 437100, C30B 2500

Patent

active

053022319

ABSTRACT:
The present invention relates to a method for growing diamond on a diamond substrate by chemical vapor deposition. The inventive method comprises alternatingly contacting at elevated temperature said diamond substrate with a gas having the formula C.sub.n X.sub.m and then with a gas having the formula C.sub.l Z.sub.p. X and Z each form single bonds with carbon. X and Z also are reactable to form ZX or a derivative thereof. The Z--X bond is stronger than the C--X bond and also is stronger than the C--Z bond. In the formulas, n, m, l, and p are integers. If C.sub.n X.sub.m and C.sub.l Z.sub.p do not react in the gas phase, then a gas mixture of them can be used to grow diamond instead of the alternating exposure of one and then the other.

REFERENCES:
patent: 3030188 (1962-04-01), Eversole
patent: 4882138 (1989-11-01), Pinneo
patent: 4915977 (1990-04-01), Okamoto et al.
patent: 4981818 (1991-01-01), Anthony et al.
patent: 5071677 (1991-12-01), Patterson et al.

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