CVD apparatus

Details CVD apparatus CVD apparatus

1996-04-22

1997-10-14

Niebling, John

Coating apparatus

Solid member or material acting on coating after application

Rotary member

118723ER, C23C 1600

Patent

active

056767587

ABSTRACT:
A CVD mechanism includes a reactor, a substrate holder, a heating apparatus for heating the substrate holder, a reaction gas supply plate for supplying reaction gas into the reactor, and at least two cylinders disposed in a concentric form on the substrate-facing surface of the reaction gas supply plate so that reaction gas is supplied from an inward portion of each cylinder in the reaction gas supply plate. A power supply mechanism for supplying power to the reaction gas supply plate and the substrate holder, and ring magnets disposed in the upper and lower portions of the reactor are provided so that magnetic lines of force passing through a plasma space are generated by the facing magnetic pole parts of the respective magnets.

REFERENCES:
patent: 4482419 (1984-11-01), Tsukada et al.
patent: 5230741 (1993-07-01), van de Ven et al.
patent: 5374594 (1994-12-01), van de Ven et al.

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