CVD apparatus

Details CVD apparatus CVD apparatus

1992-09-08

1995-06-27

Breneman, R. Bruce

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427488, 427489, 427497, 427509, 427515, H01L 2100

Patent

active

054278244

ABSTRACT:
An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.

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