X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-07-25
2008-08-19
Song, Hoon (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000
Reexamination Certificate
active
07415096
ABSTRACT:
A method for producing X-ray optics includes providing a wafer of crystalline material having front and rear surfaces and a lattice spacing suitable for reflecting incident X-rays of a given wavelength. A thin film is deposited on the front surface of the wafer so as to generate compressive forces in the thin film sufficient to impart a concave curvature to the rear surface of the wafer with at least one radius of curvature selected for focusing the incident X-rays.
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U.S. Appl. No. 60/702,783, filed Jul. 26, 2005.
Jordan Valley Semiconductors Ltd.
Smith , Gambrell & Russell, LLP
Song Hoon
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