Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2011-07-19
2011-07-19
McDonald, Rodney G (Department: 1724)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192130, C204S298030, C204S298080
Reexamination Certificate
active
07981257
ABSTRACT:
An apparatus and technique are provided for generating a plasma using a power supply circuit and arc detection arrangement. The power supply circuit has a cathode enclosed in a chamber, and is adapted to generate a power-related parameter. The arc detection arrangement is communicatively coupled to the power supply circuit and adapted to assess the severity of arcing in the chamber by comparing the power-related parameter to at least one threshold. According to various implementations, arc occurrences, arcing duration, intensity and/or energy are measured responsive to comparing the power-related parameter to the at least one threshold. According to further implementations, the above-mentioned measured quantities are accumulated and/or further processed. An apparatus and method are also provided for detecting arc events when the current spikes above a threshold level. The method and apparatus is also for classifying the arc events based on the voltage and current signals and the duration each is beyond a threshold value.
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Buda Paul R.
Harris Raymond W.
Krauss Alan F.
McDonald Rodney G
Schneider Electric USA , Inc.
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