Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2004-05-25
2009-08-04
Gulakowski, Randy (Department: 1796)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C522S142000, C522S100000, C525S286000, C525S301000, C430S007000, C430S018000, C430S287100, C430S311000, C430S325000
Reexamination Certificate
active
07569327
ABSTRACT:
This invention relates to a novel polymer compound, and a process for preparing the same and a radical polymerizable, curable composition using the same. The polymer of the invention has in the side chain thereof a structure represented by the formula (1): wherein R1 each independently represents at least one or more organic residue selected from the group consisting of an alkylene group, a branched alkylene group, a cycloalkylene group, an aralkylene group and an arylene group, R2 each independently represents at least one or more organic residue selected from the group consisting of an alkylene group, a branched alkylene group, an alkenylene group, a branched alkenylene group, a cycloalkylene group, a cycloalkenylene group and an arylene group, and n represents an integer of 0 to 20.
REFERENCES:
patent: 2003/0060563 (2003-03-01), Kai et al.
patent: WO 03/010124 (2003-02-01), None
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Kai Kazufumi
Kamata Hirotoshi
Ohta Keisuke
Fink Brieann R
Gulakowski Randy
Showda Denko K.K.
Sughrue & Mion, PLLC
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