Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-01-21
1987-07-28
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20419212, C23C 1434
Patent
active
046830430
ABSTRACT:
A process for producing coatings comprising cubic boron nitride on a substrate is disclosed. The process involves magnetron sputter deposition of a heated BN source in an evacuated atmosphere having a limited partial pressure of nitrogen and a noble gas. During cathodic sputtering of the BN source, a metal dopant selected from Groups IA, IVA, VA, VIIA, IB, IIB, IIIB, IVB and VB of the periodic table, the metal dopant preferably being Al or Cu, is deposited at a concentration less than 1.5 atomic percent.
REFERENCES:
patent: 3743551 (1973-07-01), Sanderson
patent: 4297387 (1981-10-01), Beale
patent: 4412899 (1983-11-01), Beale
patent: 4415420 (1983-11-01), Beale
patent: 4426268 (1984-01-01), Cukauskas
Melton Carl W.
Thompson Dale G.
Vassamillet Larry F.
Wickersham Charles E.
Battelle Development Corporation
Mieliulis Benjamin
Nguyen Nam X.
Niebling John F.
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