Crystallographic metrology and process control

Radiant energy – Inspection of solids or liquids by charged particles

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S307000, C250S310000, C117S902000

Reexamination Certificate

active

10505198

ABSTRACT:
A system (70) for crystallography including a sample holder (74), an electron source (76) for generating an electron beam, and a scanning actuator (80) for controlling the relative movement between the electron beam and the crystalline sample, the scanning actuator being controllable for directing the electron beam at a series of spaced apart points within the sample area. The system also includes an image processor (84) for generating crystallographic data based upon electron diffraction from the crystalline sample and for determining whether sufficient data have been acquired to characterize the sample area. The system further includes a controller (86) for controlling the scanning actuator to space the points apart such that acquired data is representative of a different grains within the crystalline sample. IN other embodiments, the invention includes one or more ion beams (178, 188) for crystallography and a combination ion beam/electron beam (218, 228).

REFERENCES:
patent: 5463977 (1995-11-01), Manada et al.
patent: 6577970 (2003-06-01), Houge et al.
patent: 2006/0048697 (2006-03-01), Houge et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Crystallographic metrology and process control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Crystallographic metrology and process control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Crystallographic metrology and process control will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3911637

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.