Crystallization apparatus and crystallization method

Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – With means for measuring – testing – or sensing

Reexamination Certificate

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Details

C117S202000, C117S041000, C117S042000

Reexamination Certificate

active

07964035

ABSTRACT:
A crystallization apparatus is provided. The crystallization apparatus includes a visible light source capable of obtaining high energy density output therein. A visible light irradiation system is formed by a plurality of visible laser beam sources arranged in a two-dimensional array. The visible light irradiation system includes a light intensity distribution forming apparatus for patterning light intensity distribution of a plurality of visible laser beams emitted by each visible laser beam source, and an imaging optical system for imaging the light having the light intensity distribution patterned by the light intensity distribution forming apparatus onto an irradiated region on the processed substrate. The visible laser beams emitted by a plurality of solid lasers or semiconductor lasers are overlapped in the light intensity distribution forming apparatus that satisfies an imaging position relationship in an optical axis with respect to the processed substrate.

REFERENCES:
patent: 2005/0266591 (2005-12-01), Hideo
patent: 2006/0087922 (2006-04-01), Cheong et al.
patent: 1497684 (2004-05-01), None
patent: 1691278 (2005-11-01), None
patent: 2000-068520 (2000-03-01), None
patent: 2002-261015 (2002-09-01), None
patent: 2005-294801 (2005-10-01), None
patent: 2006-066462 (2006-03-01), None

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