Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2009-03-03
2010-12-28
Lindsay, Jr., Walter L (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S584000, C438S048000, C136S246000, C257SE31001, C257SE25009
Reexamination Certificate
active
07858427
ABSTRACT:
A method is provided for making a crystalline silicon solar cell on a low purity substrate by depositing p+-p-n+, or n+-n-p+ layers of amorphous silicon, depending on the type of wafer, on a crystalline silicon substrate, such as an upgraded metallurgical grade silicon substrate, with substrate vias of varying diameters formed thereon, annealing the stack of amorphous silicon layers to cause solid phase epitaxial crystallization, and metallizing the substrate assembly using standard metallization techniques. One embodiment of the present invention provides depositing a passivation layer onto the third deposited silicon layer subsequent to the crystallization. Another embodiment provides depositing a passivation layer on the back side of the substrate subsequent to crystallization and punching selected regions at the substrate vias prior to back metallization.
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Applied Materials Inc.
Lindsay, Jr. Walter L
Patterson & Sheridan LLP
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